Varistor performance of nanocrystalline Zn–Bi–O thin films prepared by reactive RF magnetron sputtering at room temperature
نویسندگان
چکیده
The Zn–Bi–O films were deposited by reactive radio frequency magnetron sputtering in oxygen atmosphere from ZnBi alloy target (wt% ratio Zn:Bi=9:1) on glass substrate at room temperature. The XRD patterns show that the films deposited on tin-doped indium oxide/glass substrates were nanocrystalline. The microstructure of Bi-doped ZnO films was studied by scanning electron microscopy in combination with energy dispersive X-ray spectroscopy. All the obtained layers had varistor-type non-linear current–voltage (I–V) characteristics with low breakdown voltage varying from few tenths of a volt to few volts. r 2004 Elsevier Ltd. All rights reserved.
منابع مشابه
The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films
In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are characterized by XRD, AFM, Uv-visible and four-point probe analysis respectively. The results show...
متن کاملThe Effect of Substrate on Structural and Electrical Properties of Cu3N Thin Film by DC Reactive Magnetron Sputtering
The aim of this paper is to study the effect of substrate on the Cu3N thin films. At first Cu3N thin films are prepared using DC magnetron sputtering system. Then structural properties, surface roughness, and electrical resistance are studied using X-ray diffraction (XRD), the atomic force microscope (AFM) and four-point probe techniques respectively. Finally, the results are investigated and c...
متن کاملPhysical Properties of Reactively Sputter-Deposited C-N Thin Films
This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...
متن کاملEffect of Thickness on Properties of Copper Thin Films Growth on Glass by DC Planar Magnetron Sputtering
Copper thin films with nano-scale structure have numerous applications in modern technology. In this work, Cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The thickness effect on the structural, mo...
متن کاملColumnar Growth of Nanocrystalline ZnO Thin Films Prepared through RF Magnetron Sputtering
Nanocrystalline zinc oxide thinfilms have been prepared on glass substrates at different temperatures through planar RF-magnetron sputtering. The particle size reduction with respect to substrate temperature has been studied with x-ray 144 K. Saravanakumar et al diffraction (XRD) and atomic force microscopy (AFM). Cross-sectional transmission electron microscopic (TEM) studies employing dark-fi...
متن کامل